Article10.1016/j.mssp.2015.07.059
Damage accumulation during cryogenic and room temperature implantations in strained SiGe alloys
Anthony Payet,Flavia Piegas Luce,C. Curfs,B. Mathieu,B. Sklénard,Jean-Charles Barbé+7 more-2015-07-31-Materials Science in Semiconductor Processing
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Keywords
GermaniumMaterials scienceMonte Carlo methodEpitaxyCalibrationSiliconAmorphous solidKinetic energy
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