Nanoindentation Measurement for a Tungsten (001) Single Crystal.
TL;DRAbstract
Nanoindentation measurement for a tungsten (001) single crystal was conducted using an AFM ultramicro-hardness tester. For an electrolytically polished tungsten (001) single crystal, sudden penetration of around 50 nm occurred at 1.3mN using a three-sided pyramidal indenter with an apical angle of 115°, and at 0.24 mN using an indenter of 60°. However, this behavior did not occur for the mechanically polished surface, where a heavily deformed layer of no more than 6 μm in thickness existed. These findings lead to the idea that such phenomena arise from the same source as upper/lower yield behavior in tensile tests for bcc crystals, i.e., relatively high Peiels potentials and low dislocation mobility. Also, the radius of curvature of the indenter, which is of great importance in nanoindentation, was estimated from both load-penetration depth curves and AFM topographic images.
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Nanoindentation measurement for a tungsten (001) single crystal was conducted using an AFM ultramicro-hardness tester. For an electrolytically polished tungsten (001) single crystal, sudden penetration of around 50 nm occurred at 1.3mN using a three-sided pyramidal indenter with an apical angle of 115°, and at 0.24 mN using an indenter of 60°. However, this behavior did not occur for the mechanically polished surface, where a heavily deformed layer of no more than 6 μm in thickness existed. These findings lead to the idea that such phenomena arise from the same source as upper/lower yield behavior in tensile tests for bcc crystals, i.e., relatively high Peiels potentials and low dislocation mobility. Also, the radius of curvature of the indenter, which is of great importance in nanoindentation, was estimated from both load-penetration depth curves and AFM topographic images.
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