Modeling of profile effects for the LLNL Large Area Inductively Coupled Plasma Source
TL;DRAbstract
Inductively coupled plasma (ICP) sources are one of the most important high density plasma configurations developed in recent years. Next generation technology requires plasma processing systems with high uniformity over very large areas. The authors present here a comparison between computer modeling and experimental results from the LLNL Large Area ICP Source. The LLNL experiment has a 30 inches diameter and is designed to study 400mm. processing. Computer simulations using the fluid code, INDUCT94, are used to explain variations in the plasma density profile measurements as a function of inductive power and gas pressure. Trends in density profile versus pressure and power found in the simulation match those found in the experiment. Uniformity of the order of several percent was found to be possible over a 400mm diameter area.
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Inductively coupled plasma (ICP) sources are one of the most important high density plasma configurations developed in recent years. Next generation technology requires plasma processing systems with high uniformity over very large areas. The authors present here a comparison between computer modeling and experimental results from the LLNL Large Area ICP Source. The LLNL experiment has a 30 inches diameter and is designed to study 400mm. processing. Computer simulations using the fluid code, INDUCT94, are used to explain variations in the plasma density profile measurements as a function of inductive power and gas pressure. Trends in density profile versus pressure and power found in the simulation match those found in the experiment. Uniformity of the order of several percent was found to be possible over a 400mm diameter area.
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