Influence of an addition of H2 in a N2 CCP discharge

TL;DRAbstract

The present work involves the study of Capacitively Coupled Plasmas (CCPs) produced at 13.56 MHz radio-frequency (RF) and 0.2 to 1.2 mbar pressures. The main characteristics of the CCP source, which is described with more detail in reference [1], are the following: (i) the discharge is confined laterally by a grounded cylindrical metallic grid; (ii) the gas is continuously injected into the chamber through the driven electrode, ensuring a uniform gas flow; and (iii) gases are pumped by a rotary-vane vacuum pump. In a parent abstract [2] we study CCPs produced in pure N2. Here we analyse the effect (upon both the electrical discharge and the plasma) of adding a small amount of H2 (up to 5%) to the RF nitrogen plasma. The measured discharge parameters are: (i) the applied voltage Vrf (which is kept constant as we vary the pressure and the concentration of H2); (ii) the self-bias potential Vdc of the polarized electrode; and (iii) the absorbed RF power. We observe that, for the same Vrf v

Chat with Paper

AI Agents for this Paper