Book Chapter10.1007/978-94-009-0913-7_24

Formation of Epitaxial CoSi2 Films on Si(111) a Low Temperature (≤400°C)

L. Haderbache,P. Wetzel,Candido Fabrizio Pirri,J.C. Peruchetti,D. Bolmont,G. Gewinner-1989-01-01

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Keywords

Materials scienceAnnealing (glass)EpitaxyCrystallinityLow-energy electron diffractionThin filmAnalytical Chemistry (journal)Substrate (aquarium)

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