Mikro- und Nanostrukturierung von Polymeroberflächen mittels Mehrstrahl-Laserinterferenz-Technik

TL;DRAbstract

A two-beam laser interference technique is used for exposure of photoresist in combination with an etching technique. It is used in many different domains to generate micro- and nano-structures (interference-lithography). But this technique is time consuming and expensive. However if a photoresist is spun on a surface of a substrate and afterwards structured directly using a laser interference technique the whole process is quicker and much cheaper. In the presented doctoral thesis the direct structuring of different polymers and for the first time different photoresists are investigated. Different laser interference techniques for structuring are depicted. In addition to surface structuring via ablation by means of three-beam laser interference technique this thesis depicts at the first time a photo thermal induced structuring of the surface of a photoresist below the ablation threshold. The two-beam interference technique and the symmetrically three-beam laser interference technique

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