Book Chapter10.1016/b978-0-08-027625-0.50032-0

COMBINED APPLICATIONS OF ION IMPLANTATION AND SIMS TO STUDY THE INFLUENCE OF DOPANTS ON THE GROWTH OF OXIDE FILMS

D. Loison,J.C. Pivin,J. Chaumont-1982-01-01-Elsevier eBooks

1

Chat with Paper

AI Agents for this Paper

No abstract available for this paper.

Keywords

DopantSecondary ion mass spectrometryNon-blocking I/OMaterials scienceThermogravimetryIonIon implantationOxide

Chat

Click to start Chat