Study of Ultrathin In-Ag Layers οn Tungsten by Means of Surface Spectroscopy Techniques

TL;DRAbstract

Auger electron spectroscopy, X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, scanning tunnelling microscopy, low energy electron diffraction, and thermodesorption methods were used to investigate the process of growth of ultrathin In films and formation of In-Ag surface alloys on tungsten substrate. Several indium layers, having coverage ranging from 0.2 to 0.8 ML were deposited on tungsten substrate in room temperature. It was found that at the lowest coverages ( = 0.1-0.3 ML) indium atoms form (3 1) structure, characterized by very sharp low energy electron diffraction patterns. With increasing they tend to form densely packed islands interpreted as slightly distorted In(111) monolayers. Surface diffusion of In onto the tungsten surface was studied by using ESCA imaging property of SCIENTA ESCA200 instrument. Measuring the photoelectron intensity as a function of two spatial coordinates and the energy, we observed movement of In atoms on the tungsten surface

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