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Open AccessArticle10.12693/aphyspola.80.699

Ising Model of Thin Film with Random Surface Field

Z. Onyszkiewicz-1991-11-01-Acta Physica Polonica A

TL;DRAbstract

Thermodynamical properties of an Ising model of a ferromagnetic thin film deposited onto a ferromagnetic substrate of rough surface contacting the thin film were studied. The influence of the interaction between the substrate and the film as well as the effect of the substrate surface roughness were found to be describable in this model by a temperature dependent random surface field. Magnetization of the thin film was calculated for various temperatures at different assumed values of the substrate Curie temperature as well as for various surface roughness grades of the substrate and various couplings between the film and the substrate.

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Thermodynamical properties of an Ising model of a ferromagnetic thin film deposited onto a ferromagnetic substrate of rough surface contacting the thin film were studied. The influence of the interaction between the substrate and the film as well as the effect of the substrate surface roughness were found to be describable in this model by a temperature dependent random surface field. Magnetization of the thin film was calculated for various temperatures at different assumed values of the substrate Curie temperature as well as for various surface roughness grades of the substrate and various couplings between the film and the substrate.

Keywords

Ising modelMaterials scienceField (mathematics)Surface (topology)Condensed matter physicsStatistical physicsPhysicsMathematics

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