TL;DRAbstract
The application of the metalorganic chemical vapour deposition technique to the production of II-VI compound semiconductor electroluminescent devices is discussed. Both low field MIS minority carrier injection devices and high field impact excitation structures are considered, and comparisons are drawn with more commiercially orientated electroluminescent displays. The epitaxial growth of ZnS and ZnSe onto (100) orientated GaAs substrates, using the reactions between dimethyl zinc and the hydrides HgS and H2Se, is described. Details are given of a novel epitaxial MISi device processing technology, in which a ZnS I-layer also acts as an etch-stop, thus enabling chemical removal of the GaAs substrate. Metal electrodes deposited directly onto the ZnS and ZnSe allow the electrical and electroluminescent characteristics of these epitaxial II-VI compound layers to be investigated in the absence of any influence from the substrate material. X-ray diffraction and reflection high energy electro
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The application of the metalorganic chemical vapour deposition technique to the production of II-VI compound semiconductor electroluminescent devices is discussed. Both low field MIS minority carrier injection devices and high field impact excitation structures are considered, and comparisons are drawn with more commiercially orientated electroluminescent displays. The epitaxial growth of ZnS and ZnSe onto (100) orientated GaAs substrates, using the reactions between dimethyl zinc and the hydrides HgS and H2Se, is described. Details are given of a novel epitaxial MISi device processing technology, in which a ZnS I-layer also acts as an etch-stop, thus enabling chemical removal of the GaAs substrate. Metal electrodes deposited directly onto the ZnS and ZnSe allow the electrical and electroluminescent characteristics of these epitaxial II-VI compound layers to be investigated in the absence of any influence from the substrate material. X-ray diffraction and reflection high energy electro
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