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Zdejmowanie cienkich warstw z płytek krzemowych metodą utleniania anodowego i rozpuszczania utworzonego tlenku = Removal of thin layers from silicon wafersby means of an anodic oxidation and dissolution of the oxides formed
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Keywords
SiliconElectronic materialsMaterials scienceDissolutionAnodeThin filmAnodic oxidationNanotechnology
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