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酸素分子への共鳴付着による電子速度分布の Hole Burning

Katsuhisa Koura,勝久 古浦-1982-03-01-JAXA Repository (JAXA)
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TL;DRAbstract

The hole burning into the velocity distribution of thermal electrons due to the resonance attachment to O_2 (e+O_2⟶O_2^<-*>) is studied using the Monte Carlo simulation. The thermal molecular motion is found to play an important role in the hole burning process : The attachment hole is not burned at room temperature and appears at the lower temperature T⋦100°K owing to the decrease in the thermal molecular motion. Therefore, the attachment rate constant measured by Shimamori and Hatano at room temperature does not suffer the attachment cooling effect indicated by Crompton et al.

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The hole burning into the velocity distribution of thermal electrons due to the resonance attachment to O_2 (e+O_2⟶O_2^<-*>) is studied using the Monte Carlo simulation. The thermal molecular motion is found to play an important role in the hole burning process : The attachment hole is not burned at room temperature and appears at the lower temperature T⋦100°K owing to the decrease in the thermal molecular motion. Therefore, the attachment rate constant measured by Shimamori and Hatano at room temperature does not suffer the attachment cooling effect indicated by Crompton et al.

Keywords

Environmental scienceGeology

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