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Open AccessDissertation10.47749/t/unicamp.2008.437621

Sensor de pressão microeletronico baseado no efeito piezoresistivo transversal em silicio

TL;DRAbstract

This work describes a CMOS-Compatible multiterminal piezoresistive pressure sensor based on the transversal piezoresistive effect, which consists of a piezotransducer fabricated on a membrane. The layout of this piezoelement is designed in such a way that its sensitivity is improved by maximizing the effect of the mechanical stress over the equipotential lines distribution in its active region. We performed Element Finite analyses in both membrane and piezoelement designs. The sensor was fabricated using two different technologies: CMOS 0,35 m AMS process (Austria Mikro Systeme International)supported by the Fapesp Multi-User Project -and CCS/Unicamp process (Center for Semiconductor Components). In the AMS process, we realized a diaphragm by reducing the thickness of the die through a mechanical polishing process. In the sensor fabricated at CCS/Unicamp process, a backside bulk micro-machining was performed by using an automated KOH chemical etching apparatus, which provides a well-co

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This work describes a CMOS-Compatible multiterminal piezoresistive pressure sensor based on the transversal piezoresistive effect, which consists of a piezotransducer fabricated on a membrane. The layout of this piezoelement is designed in such a way that its sensitivity is improved by maximizing the effect of the mechanical stress over the equipotential lines distribution in its active region. We performed Element Finite analyses in both membrane and piezoelement designs. The sensor was fabricated using two different technologies: CMOS 0,35 m AMS process (Austria Mikro Systeme International)supported by the Fapesp Multi-User Project -and CCS/Unicamp process (Center for Semiconductor Components). In the AMS process, we realized a diaphragm by reducing the thickness of the die through a mechanical polishing process. In the sensor fabricated at CCS/Unicamp process, a backside bulk micro-machining was performed by using an automated KOH chemical etching apparatus, which provides a well-co

Keywords

Piezoresistive effectSensitivity (control systems)Materials scienceEtching (microfabrication)Electrical engineeringLinearityChemical-mechanical planarizationOptoelectronics

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