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Article10.1504/ijmsi.2015.075829

Effect of sputtering power on nano-mechanical properties of ZnO film

Miao Zhang,Ningbo Liao,Pengfei Chen,Wei Xue-2015-01-01-International Journal of Materials and Structural Integrity
3

TL;DRAbstract

In this study, unbalanced magnetron sputtering approach was used to prepare ZnO film by using high-purity ZnO target. Nano-indentation and scratch test were used to study the mechanical properties of ZnO film at different sputtering powers. According to the experimental results, optimums of Young's modulus, surface roughness and adhesion strength are present at an optimal sputtering power.

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In this study, unbalanced magnetron sputtering approach was used to prepare ZnO film by using high-purity ZnO target. Nano-indentation and scratch test were used to study the mechanical properties of ZnO film at different sputtering powers. According to the experimental results, optimums of Young's modulus, surface roughness and adhesion strength are present at an optimal sputtering power.

Keywords

Materials scienceSputteringNano-Sputter depositionNanoindentationSurface roughnessScratchComposite material

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