Book Chapter10.1007/978-1-4613-4196-3_8

Defects Introduced into Silicon by Boron Implantation in the MeV Energy Range

J.C. Müller,R. Stuck,P. Siffert,S. Kalbitzer-1977-01-01

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Keywords

BoronSiliconMaterials scienceAnnealing (glass)Ion implantationRange (aeronautics)Low energyIon

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