Optimisation of deposition conditions for functional oxide thin films

Open AccessArticle

Optimisation of deposition conditions for functional oxide thin films

Sharath Sriram,Madhu Bhaskaran-2010-01-01-RMIT Research Repository (RMIT University Library)

0

TL;DRAbstract

This chapter describes a systematic approach to determining the optimal conditions required to deposit thin films of complex functional oxides using RF magnetron sputtering. The motivation of this study was to attain films of designed stoichiometry and of preferentially oriented perovskite crystal structure, as the composition and structure of complex oxide determines their functionality (eg. ferroelectricity, piezoelectricity, etc) which is exploited by a variety of applications.

Chat with Paper

AI Agents for this Paper

This chapter describes a systematic approach to determining the optimal conditions required to deposit thin films of complex functional oxides using RF magnetron sputtering. The motivation of this study was to attain films of designed stoichiometry and of preferentially oriented perovskite crystal structure, as the composition and structure of complex oxide determines their functionality (eg. ferroelectricity, piezoelectricity, etc) which is exploited by a variety of applications.

Keywords

Thin filmPerovskite (structure)StoichiometrySputter depositionMaterials scienceDeposition (geology)FerroelectricityOxide

Chat

Click to start Chat