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Open AccessArticle10.12693/aphyspola.120.a-17

Schottky Junctions Based on the ALD-ZnO Thin Films for Electronic Applications

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The ZnO-based Schottky diodes revealing a high rectication ratio may be used in many electronic devices. This paper demonstrates several approaches to obtain a ZnO-based Schottky junction with a high rectication ratio. The authors tested several methods such as: post-growth annealing of the ZnO layer, acceptor (nitrogen) doping, as well as the ZnO surface coating with a properly chosen dielectric material. The inuence of these approaches on the diode's rectication ratio together with modeling based on the dierential approach and thermionic emission theory are presented.

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The ZnO-based Schottky diodes revealing a high rectication ratio may be used in many electronic devices. This paper demonstrates several approaches to obtain a ZnO-based Schottky junction with a high rectication ratio. The authors tested several methods such as: post-growth annealing of the ZnO layer, acceptor (nitrogen) doping, as well as the ZnO surface coating with a properly chosen dielectric material. The inuence of these approaches on the diode's rectication ratio together with modeling based on the dierential approach and thermionic emission theory are presented.

Keywords

Materials scienceOptoelectronicsSchottky barrierThin filmSchottky diodeNanotechnologyEngineering physicsPhysics

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