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室温下用PECVD制备单氢键为主的a—Si：H薄膜
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室温下用PECVD制备单氢键为主的a—Si：H薄膜
胡刚
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1997-01-01
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Acta Scientiarum Naturalium Universitatis Sunyatseni
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Keywords
Plasma-enhanced chemical vapor deposition
Materials science
Nanotechnology
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