Numerical analysis approach to thermal stress effects on dislocation behavior due to incomplete seeding in Czochralski (CZ) silicon crystal growth
2025 · Japanese Journal of Applied Physics · 0 citations
https://doi.org/10.35848/1347-4065/adff8c
Claim or correct this author profile
Claim this profile or suggest corrections to the name, affiliation, bio, photo, or paper titles. Approved changes appear as verified CitedEvidence overlays.
25
Papers
449
Citations
6
h-index
4
i10-index
H. Tsukada is an academic researcher from Shinshu University. The author has contributed to research in topics: Analytical Chemistry and Chromatography & Crystallization and Solubility Studies & X-ray Diffraction in Crystallography. The author has an h-index of 6, co-authored 22 publications.
Click to start Chat