Effects of deep reactive ion etching parameters on etching rate and surface morphology in extremely deep silicon etch process with high aspect ratio
2017 · Advances in Mechanical Engineering · 52 citations
https://doi.org/10.1177/1687814017738152
T
Tiantong Xu
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12
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14
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Tiantong Xu is an academic researcher from Chengdu University of Technology. The author has contributed to research in topics: Advanced MEMS and NEMS Technologies & Heat Transfer and Optimization & Innovative Energy Harvesting Technologies. The author has an h-index of 12, co-authored 46 publications.
ORCID: 0000-0002-0840-6692Papers by this author
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