Influence of the oxidation in the metal silicide/Si3N4 interfaces on the etching profile
2004 · Microelectronic Engineering · 0 citations
https://doi.org/10.1016/j.mee.2004.07.068
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K.K. Chi
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K.K. Chi is an academic researcher from Samsung (South Korea). The author has contributed to research in topics: Semiconductor materials and devices & Thin-Film Transistor Technologies & Silicon and Solar Cell Technologies.
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