Deposition selectivity on oxide versus metal surfaces via catalyzed atomic layer deposition of SiO2 and vapor-dosed phosphonic acid inhibitors
2025 · Applied Surface Science · 2 citations
https://doi.org/10.1016/j.apsusc.2025.162337
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Junghun Kwak is an academic researcher from Tech University of Korea. The author has contributed to research in topics: Semiconductor materials and devices & Molecular Junctions and Nanostructures & Copper Interconnects and Reliability. The author has an h-index of 2, co-authored 5 publications.
https://doi.org/10.1016/j.apsusc.2025.162337
https://doi.org/10.1186/s40580-025-00490-5
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