Lowering of interface state density between deposited gate oxide and SiC substrate via controlling substrate oxidation
2024 · Vacuum · 8 citations
https://doi.org/10.1016/j.vacuum.2024.112999
Claim or correct this author profile
Claim this profile or suggest corrections to the name, affiliation, bio, photo, or paper titles. Approved changes appear as verified CitedEvidence overlays.
30
Papers
142
Citations
8
h-index
6
i10-index
Nannan You is an academic researcher from Chinese Academy of Sciences. The author has contributed to research in topics: Semiconductor materials and devices & Silicon Carbide Semiconductor Technologies & Thin-Film Transistor Technologies. The author has an h-index of 8, co-authored 26 publications.
https://doi.org/10.1016/j.vacuum.2024.112999
https://doi.org/10.1016/j.vacuum.2025.114862
Click to start Chat