Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicate
2021 · Journal of Materials Research and Technology · 10 citations
https://doi.org/10.1016/j.jmrt.2021.04.067
K
Konstantina Christina Topka
Claim or correct this author profile
Claim this profile or suggest corrections to the name, affiliation, bio, photo, or paper titles. Approved changes appear as verified CitedEvidence overlays.
20
Papers
76
Citations
6
h-index
4
i10-index
Konstantina Christina Topka is an academic researcher from Air Liquide (United Kingdom). The author has contributed to research in topics: Semiconductor materials and devices & Advanced ceramic materials synthesis & Metal and Thin Film Mechanics. The author has an h-index of 6, co-authored 17 publications.
ORCID: 0000-0002-2364-1455Papers by this author
worksChemical and mechanical performances of CVD‑silicon oxycarbonitride films for corrosion protection applications: Towards inert coatings in aggressive aqueous media
2025 · Surface and Coatings Technology · 1 citations
https://doi.org/10.1016/j.surfcoat.2025.131756
Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements
2025 · npj Materials Degradation · 0 citations
https://doi.org/10.1038/s41529-025-00610-w
Research topics
topicsChat about Author
Papers
Chat
Click to start Chat