Annealing influence on stoichiometry and band alignment of 4H-SiC/SiO<sub>2</sub> interface evaluated by x-ray photoelectron spectroscopy
2024 · Semiconductor Science and Technology · 1 citations
https://doi.org/10.1088/1361-6641/ad7b6d
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Mu He
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Mu He is an academic researcher.
ORCID: 0009-0007-6555-058XPapers by this author
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