Book Chapter10.1007/978-1-4684-3947-2_31

Chlorine Incorporation and Phase Separation at the SiO2/Si Interface During Thermal Oxidation of Silicon in Cl/O2 Atmospheres

Michael D. Monkowski,J. R. Monkowski,R. E. Tressler,J. Stach-1981-01-01

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Keywords

Oxidizing agentChlorineAlkali metalSiliconOxideMaterials scienceInorganic chemistryThermal oxidation

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