Correlation of plasma process induced charging with Fowler-Nordheim stress in p- and n-channel transistors
1992 · 30 citations
https://doi.org/10.1109/iedm.1992.307310
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Sabi is an academic researcher from Intel (United States). The author has contributed to research in topics: Semiconductor materials and devices & Advancements in Semiconductor Devices and Circuit Design & Integrated Circuits and Semiconductor Failure Analysis. The author has an h-index of 1, co-authored 1 publications.
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